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Sputter depth profiling in mineral-surface analysis
Michael F. Hochella, James R. Lindsay, Victor G. Mossotti and Carrick M. Eggleston
Sputter depth profiling in mineral-surface analysis
American Mineralogist (December 1988) 73 (11-12): 1449-1456
Sputter depth profiling in mineral-surface analysis
American Mineralogist (December 1988) 73 (11-12): 1449-1456
Index Terms/Descriptors
- albite
- anhydrite
- Auger spectroscopy
- calcite
- carbonates
- chemical analysis
- electron probe
- experimental studies
- feldspar group
- framework silicates
- methods
- minerals
- natural materials
- plagioclase
- quartz
- radiation damage
- silica minerals
- silicates
- spectroscopy
- sulfates
- techniques
- X-ray spectroscopy
- ion bombardment
- sputter depth profiling
Abstract
The effects of ion bombardment on homogeneous samples of quartz, albite, calcite and anhydrite have been studied with X-ray photoelectron spectroscopy (XPS) in order to study the usefulness and limitations of sputter depth profiles of minerals.
ISSN: 0003-004X
EISSN: 1945-3027
Coden: AMMIAY
Serial Title: American Mineralogist
Serial Volume: 73
Serial Issue: 11-12
Title: Sputter depth profiling in mineral-surface analysis
Affiliation: Stanford Univ., Dep. Geol.,
Stanford, CA,
United States
Pages: 1449-1456
Published: 198812
Text Language: English
Publisher: Mineralogical Society of America,
Washington, DC,
United States
References: 53
Accession Number: 1989-011955
Categories: General mineralogyGeneral geochemistry
Document Type: Serial
Bibliographic Level: Analytic
Illustration Description: illus.
Secondary Affiliation: U. S. Geol. Surv.,
USA,
United States
Country of Publication: United States
Secondary Affiliation: GeoRef, Copyright 2017, American Geosciences Institute. Reference includes data from Mineralogical Abstracts, United KingdomTwickenhamUKUnited Kingdom
Update Code: 1989
Program Name: USGSOPNon-USGS publications with USGS authors
